Fujifilm has announced plans to establish a greenfield semiconductor materials manufacturing facility in India, with a total investment of approximately ₹800 crore ($83 million). The company announced the investment on September 16, with commercial production expected to begin in FY28.
The investment will be made in 2 phases, beginning in October 2026. The phased approach will align with industry growth and customer demand.
Under Phase 1, Fujifilm will focus on processes supporting front-end semiconductor chemicals. Phase 2 will cover semiconductor surface conditioning materials and high-purity chemicals, based on the pace of development of the semiconductor industry in the coming years.
The company said the facility will support its plans to expand semiconductor materials manufacturing in India and strengthen its capabilities in the growing semiconductor ecosystem.
“Fujifilm will work closely with the vision of the India Semiconductor Mission and seeks to utilise the patronage of the Government of India under the ISM 2.0 policy, which was approved by the Government of India in July 2026,” the company said in its statement.
Fujifilm has previously outlined plans to develop semiconductor materials tailored to the needs of customers in India and has been working toward expanding its semiconductor materials presence in the country.
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