Dutch semiconductor equipment manufacturer ASML plans to collaborate with its major customers to deploy its most advanced tools for producing large data center chips designed by firms such as Nvidia, according to a news report by Reuters.
The Dutch company manufactures lithography equipment, which prints integrated circuits onto silicon wafers by projecting light through a patterned mask that holds the chip design.
Currently, the firm’s widely deployed extreme ultraviolet (EUV) systems print semiconductors measuring up to roughly 800 square millimeters. Modern technology firms, including Nvidia and Google, routinely design processors right up to that physical boundary.
As per Reuters, ASML’s forthcoming generation of machines, termed “High NA” EUV tools, prints circuitry with significantly finer details. However, these incoming tools currently face restrictions regarding the physical dimensions of the chips they produce because they rely on a smaller mask.
While Intel already uses ASML’s newest tools to manufacture its laptop processors, ASML announced it plans to shift toward a larger mask dimension. This transition intends to allow the latest lithography equipment to fabricate processors as large as the biggest data center semiconductors made today.
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