Fujifilm Corporation in Japan has opened a new development and evaluation building at its Shizuoka Factory. The facility began operations this month and marks a major step in strengthening the company’s semiconductor materials business.
The investment increases Fujifilm’s ability to evaluate performance and quality. It will help speed up the development of advanced and next generation semiconductor materials while supporting a stable supply of high quality products. The move comes at a time when global demand for semiconductors used in artificial intelligence, fifth generation networks, and the internet of things continues to grow.
Fujifilm’s semiconductor materials business has seen sales almost double between the financial years of 2021 and 2024. It has now become a major growth driver for the group. To support this expansion, the company invested more than one hundred billion yen in its facilities from the financial years of 2021 to 2024. It plans to invest more than one hundred billion yen again from the financial years of 2025 to 2026.
The new building at Shizuoka includes cleanrooms with high cleanliness standards, modern evaluation equipment, and inspection systems powered by artificial intelligence. These systems detect very small particles to improve analysis accuracy and quality control.
A dedicated digital transformation department will also use artificial intelligence and digital tools to improve manufacturing processes. The building uses an RC column head seismic isolation structure for safety. Its cleanroom is placed twelve metres above ground level to reduce the risk of flooding.
The Shizuoka Factory works with Fujifilm’s global research and development and production sites. It supports next generation process technologies around the world. With this new facility, Fujifilm aims to speed up the development of advanced EUV, ArF, NIL, PFAS free materials, and its Wave Control Mosiac technology. This reinforces its position in the future of semiconductor innovation.
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